22 March 2011 An aberration control of projection optics for multi-patterning lithography
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In order to realize further improvement of productivity of semiconductor manufacturing, higher throughput and better imaging performance are required for the exposure tool. Therefore, aberration control of the projection lens is becoming more and more important not only for cool status performance but also heating status. In this paper, we show the improvements of cool status lens aberration, including scalar wavefront performance and polarization aberration performance. We also discuss various techniques for controlling thermal aberrations including reduction of heat in the lens, simulation, compensating knob, and adjusting method with actual imaging performance data during heating and cooling.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yasuhiro Ohmura, Yasuhiro Ohmura, Taro Ogata, Taro Ogata, Toru Hirayama, Toru Hirayama, Hisashi Nishinaga, Hisashi Nishinaga, Takeshi Shiota, Takeshi Shiota, Satoshi Ishiyama, Satoshi Ishiyama, Susumu Isago, Susumu Isago, Hidetaka Kawahara, Hidetaka Kawahara, Tomoyuki Matsuyama, Tomoyuki Matsuyama, } "An aberration control of projection optics for multi-patterning lithography", Proc. SPIE 7973, Optical Microlithography XXIV, 79730W (22 March 2011); doi: 10.1117/12.879616; https://doi.org/10.1117/12.879616

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