Scanner matching for standard and freeform illumination shapes using FlexRay

J. Bekaert; L. Van Look; K. D'havé; B. Laenens; G. Vandenberghe; P. van Adrichem; W. Shao; J. Ghan; K. Schreel; J. T. Neumann

doi:10.1117/12.881607

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22 March 2011 Scanner matching for standard and freeform illumination shapes using FlexRay

J. Bekaert, L. Van Look, K. D'havé, B. Laenens, G. Vandenberghe, P. van Adrichem, W. Shao, J. Ghan, K. Schreel, J. T. Neumann

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Proceedings Volume 7973, Optical Microlithography XXIV; 79731I (2011) https://doi.org/10.1117/12.881607
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

IC manufacturers have a strong demand for transferring a working process from one scanner to another. Recently, a programmable illuminator (FlexRay^TM) became available on ASML ArF immersion scanners that, besides all the parameterized source shapes of the earlier Aerial^TM illuminator (based on diffractive optical elements) can also produce any desired freeform source shape. As a consequence, a fabrication environment may have scanners with each of the illuminator types so both FlexRay-to-Aerial and FlexRay-to-FlexRay matching is of interest. Moreover, the FlexRay illuminator itself is interesting from a matching point-of-view, as numerous degrees of freedom are added to the matching tuning space. This paper demonstrates how the upgrade of an exposure tool from Aerial to FlexRay illuminator shows identical proximity behavior without any need for scanner tuning. Also, an assessment of the imaging correspondence between exposure tools each equipped with a FlexRay illuminator is made. Finally, for a series of use-cases where proximity differences do exist, the application of FlexRay source tuning is demonstrated. It shows an enhancement of the scanner matching capabilities, because FlexRay source tuning enables matching where traditional NA and sigma tuning are shortcoming. Moreover, it enables tuning of freeform sources where sigma tuning is not relevant. Pattern Matcher^TM software of ASML Brion is demonstrated for the calculation of the optimized FlexRay tuned sources.

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J. Bekaert, L. Van Look, K. D'havé, B. Laenens, G. Vandenberghe, P. van Adrichem, W. Shao, J. Ghan, K. Schreel, and J. T. Neumann "Scanner matching for standard and freeform illumination shapes using FlexRay", Proc. SPIE 7973, Optical Microlithography XXIV, 79731I (22 March 2011); https://doi.org/10.1117/12.881607

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