Paper
22 March 2011 Fast algorithm for quadratic aberration model based on cross triple correlation
Wei Liu, Tingting Zhou, Shiyuan Liu
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Abstract
The quadratic aberration model used in optical lithography is a natural extension of the linear model by taking into account interactions among individual Zernike coefficients. Although the model has been tested and verified in many applications, the effects of Zernike coefficients under partially coherent imaging are usually obtained by extensive experiments due to complexity of the model expression. In this paper, a generalized cross triple correlation (CTC) is introduced, and a fast algorithm to simulate the quadratic aberration model is developed. Simulations were performed by the proposed CTC based algorithm with different input Zernike aberrations for binary and phase shift masks with multiple pitches and orientations, which demonstrate that the proposed approach is not only accurate but also efficient for revealing the influence of different Zernike orders on aerial image intensity distributions under partially coherent illumination.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wei Liu, Tingting Zhou, and Shiyuan Liu "Fast algorithm for quadratic aberration model based on cross triple correlation", Proc. SPIE 7973, Optical Microlithography XXIV, 79731M (22 March 2011); https://doi.org/10.1117/12.879217
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KEYWORDS
Binary data

Phase shifts

Imaging systems

Photomasks

Lithography

Optical lithography

Coherence imaging

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