22 March 2011 Fast algorithm for quadratic aberration model based on cross triple correlation
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The quadratic aberration model used in optical lithography is a natural extension of the linear model by taking into account interactions among individual Zernike coefficients. Although the model has been tested and verified in many applications, the effects of Zernike coefficients under partially coherent imaging are usually obtained by extensive experiments due to complexity of the model expression. In this paper, a generalized cross triple correlation (CTC) is introduced, and a fast algorithm to simulate the quadratic aberration model is developed. Simulations were performed by the proposed CTC based algorithm with different input Zernike aberrations for binary and phase shift masks with multiple pitches and orientations, which demonstrate that the proposed approach is not only accurate but also efficient for revealing the influence of different Zernike orders on aerial image intensity distributions under partially coherent illumination.
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Wei Liu, Wei Liu, Tingting Zhou, Tingting Zhou, Shiyuan Liu, Shiyuan Liu, } "Fast algorithm for quadratic aberration model based on cross triple correlation", Proc. SPIE 7973, Optical Microlithography XXIV, 79731M (22 March 2011); doi: 10.1117/12.879217; https://doi.org/10.1117/12.879217

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