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5 April 2011 Quantification of the difference between two sources by Zernike polynomial decomposition
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Source Mask Optimization (SMO) technique is an advanced resolution enhancement technique with the goal of extending optical lithography lifetime by enabling low k1 imaging [1,2]. On that purpose, an appropriate source and mask duo can be optimized for a given design. SMO can yield freeform sources that can be realized to a good accuracy with optical systems such as the FlexRay [3],. However, it had been showen that even the smallest modification of the source can impact the wafer image or the process.[4] Therefore, the pupil has to be qualified, in order to measure the impact of any source deformation[5]. In this study we will introduce a new way to qualify the difference between sources, based on a Zernike polynomial decomposition [6]. Such a method can have several applications: from quantifying the scanner to scanner pupil difference, to comparing the source variation depending of the SMO settings etc. The straighforward Zernike polynomial decomposition allow us to identify some classic optical issues like coma or lens aberration.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
C. Alleaume, E. Yesilada, V. Farys, and Y. Trouiller "Quantification of the difference between two sources by Zernike polynomial decomposition", Proc. SPIE 7973, Optical Microlithography XXIV, 79731Y (5 April 2011);


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