22 March 2011 Beam shaping: top hat and customized intensity distributions for semiconductor manufacturing and inspection
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Abstract
Enabling the next technology nodes with optical technologies means further reduced error budgets for optical systems and new optical approaches for higher precision and increased throughput. This contribution discusses important aspects and features of laser beam shaping in optical systems for semiconductor manufacturing and inspection. Beam shaping principles for different types of lasers and illumination requirements are explained.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ansgar Teipel and Lutz Aschke "Beam shaping: top hat and customized intensity distributions for semiconductor manufacturing and inspection", Proc. SPIE 7973, Optical Microlithography XXIV, 797321 (22 March 2011); doi: 10.1117/12.879640; https://doi.org/10.1117/12.879640
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