22 March 2011 Hierarchical kernel generation for SMO application
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Abstract
Resolution enhancement technologies (RETs) are so far widely proposed in improving the quality of micro-lithography process. Latest method such as source mask optimization (SMO) is gaining popularity recently. Therefore, high speed simulator is in strong demand for growing computational complexity of RETs. In this work, we demonstrate that our Abbe-PCA method is highly efficient for source configuring and mask tuning using hierarchical pixel-based OPC.
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Jason Hsih-Chie Chang, Charlie Chung-Ping Chen, Lawrence S. Melvin, "Hierarchical kernel generation for SMO application", Proc. SPIE 7973, Optical Microlithography XXIV, 797323 (22 March 2011); doi: 10.1117/12.882808; https://doi.org/10.1117/12.882808
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