22 March 2011 Compensation of mask induced aberrations by projector wavefront control
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Rigorous simulation of light diffraction from optical and EUV masks predicts phase effects with an aberration like impact on the imaging performance of lithographic projection systems. This paper demonstrates the application of advanced modeling and optimization methods for the compensation of mask induced aberration effects. It is shown that proper adjustment of the wavefront results in significant reduction of best focus differences between different features.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Peter Evanschitzky, Peter Evanschitzky, Feng Shao, Feng Shao, Tim Fühner, Tim Fühner, Andreas Erdmann, Andreas Erdmann, } "Compensation of mask induced aberrations by projector wavefront control", Proc. SPIE 7973, Optical Microlithography XXIV, 797329 (22 March 2011); doi: 10.1117/12.879207; https://doi.org/10.1117/12.879207


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