22 March 2011 Advanced scanner matching using freeform source and lens manipulators
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Proximity matching is a common activity in the wafer fabs1,2,3 for purposes such as process transfer, capacity expansion, improved scanner yield and fab productivity. The requirements on matching accuracy also become more and more stringent as CD error budget shrinks with the feature size as technology advances. Various studies have been carried out, using scanner knobs including NA, inner sigma, outer sigma, stage tilt, ellipticity, and dose. In this paper, we present matching results for critical features of a logic device, between an ASML XT:19x0i scanner and an XT:1700i (reference), demonstrating the advantage of freeform illuminator pupil as part of the adjustable knobs to provide additional flexibility. We also present the investigation of a novel method using lens manipulators for proximity matching, effectively injecting scalar wavefront to an XT:19x0i to mimic the behavior of the XT:1700i lens.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jong-Ho Lim, Jong-Ho Lim, Kyung Kang, Kyung Kang, Sung-Man Kim, Sung-Man Kim, Wenjin Shao, Wenjin Shao, Fei Du, Fei Du, Zhengfan Zhang, Zhengfan Zhang, Zongchang Yu, Zongchang Yu, John Barbuto, John Barbuto, Venu Vellanki, Venu Vellanki, Yu Cao, Yu Cao, Ronald Goossens, Ronald Goossens, Seung-Hoon Park, Seung-Hoon Park, Chris K. Park, Chris K. Park, Stefan Hunsche, Stefan Hunsche, Junwei Lu, Junwei Lu, } "Advanced scanner matching using freeform source and lens manipulators", Proc. SPIE 7973, Optical Microlithography XXIV, 79732A (22 March 2011); doi: 10.1117/12.881680; https://doi.org/10.1117/12.881680

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