22 March 2011 Advanced scanner matching using freeform source and lens manipulators
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Abstract
Proximity matching is a common activity in the wafer fabs1,2,3 for purposes such as process transfer, capacity expansion, improved scanner yield and fab productivity. The requirements on matching accuracy also become more and more stringent as CD error budget shrinks with the feature size as technology advances. Various studies have been carried out, using scanner knobs including NA, inner sigma, outer sigma, stage tilt, ellipticity, and dose. In this paper, we present matching results for critical features of a logic device, between an ASML XT:19x0i scanner and an XT:1700i (reference), demonstrating the advantage of freeform illuminator pupil as part of the adjustable knobs to provide additional flexibility. We also present the investigation of a novel method using lens manipulators for proximity matching, effectively injecting scalar wavefront to an XT:19x0i to mimic the behavior of the XT:1700i lens.
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Jong-Ho Lim, Kyung Kang, Sung-Man Kim, Wenjin Shao, Fei Du, Zhengfan Zhang, Zongchang Yu, John Barbuto, Venu Vellanki, Yu Cao, Ronald Goossens, Seung-Hoon Park, Chris K. Park, Stefan Hunsche, Junwei Lu, "Advanced scanner matching using freeform source and lens manipulators", Proc. SPIE 7973, Optical Microlithography XXIV, 79732A (22 March 2011); doi: 10.1117/12.881680; https://doi.org/10.1117/12.881680
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