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23 March 2011 Evaluating the performance of DP and EUVL by using analytical equations for resolution of optical lithography with considering required DOF
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Abstract
Since CD has become extraordinary fine, the limited performance has been required for optics. Therefore computational lithography like SMO has been applied. Then it is difficult to evaluate prospectively the fundamental performance of future optical lithography. However prospective evaluation method might be useful to discuss the future lithography. Thus we had already proposed the analytical equations to evaluate resolution of RETs with considering depth of focus[1,2,4]. In this paper, we reconsider and revise the equations and evaluate the fundamental resolution of immersion DPL(Double Patterning Lithography) and EUVL(Extreme Ultra Violet Lithography).
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Masato Shibuya, Kouhei Nogami, Akira Takada, and Suezou Nakadate "Evaluating the performance of DP and EUVL by using analytical equations for resolution of optical lithography with considering required DOF", Proc. SPIE 7973, Optical Microlithography XXIV, 79732Y (23 March 2011); https://doi.org/10.1117/12.879041
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