Paper
4 April 2011 Aerial image retargeting (AIR): achieving litho-friendly designs
Author Affiliations +
Abstract
In this work, we present a new technique to detect non-Litho-Friendly design areas based on their Aerial Image signature. The aerial image is calculated for the litho target (pre-OPC). This is followed by the fixing (retargeting) the design to achieve a litho friendly OPC target. This technique is applied and tested on 28 nm metal layer and shows a big improvement in the process window performance. For an optimized Aerial-Image-Retargeting (AIR) recipe is very computationally efficient and its runtime doesn't consume more than 1% of the OPC flow runtime.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ayman Yehia Hamouda, James Word, Mohab Anis, and Karim S. Karim "Aerial image retargeting (AIR): achieving litho-friendly designs", Proc. SPIE 7974, Design for Manufacturability through Design-Process Integration V, 797411 (4 April 2011); https://doi.org/10.1117/12.882073
Lens.org Logo
CITATIONS
Cited by 3 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Optical proximity correction

Artificial intelligence

Metals

Model-based design

Resolution enhancement technologies

Lithography

Photomasks

RELATED CONTENT

Model-based HSF using by target point control function
Proceedings of SPIE (March 18 2015)
A novel full chip process window OPC based on matrix...
Proceedings of SPIE (March 15 2016)
Finding the needle in the haystack using full chip...
Proceedings of SPIE (October 20 2006)
Image fidelity verification: contourIFV
Proceedings of SPIE (May 03 2004)
Verifying RET mask layouts
Proceedings of SPIE (July 12 2002)

Back to Top