1 April 2011 Mask 3D effects: impact on imaging and placement
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Proceedings Volume 7985, 27th European Mask and Lithography Conference; 79850I (2011) https://doi.org/10.1117/12.896909
Event: 27th European Mask and Lithography Conference, 2011, Dresden, Germany
Abstract
In this paper we perform a fundamental study on the impact of mask absorber in ArF immersions lithography: the mask 3D effects. From simulations and analysis of diffraction coefficients we could identify a range of relevant features and imaging and placement phenomena. For these features, experimental results were obtained to pinpoint the mask 3D effects. We will demonstrate how to model and understand the mask 3D effects and give solutions to counteract the mask 3D effects.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jo Finders, Jo Finders, Thijs Hollink, Thijs Hollink, } "Mask 3D effects: impact on imaging and placement", Proc. SPIE 7985, 27th European Mask and Lithography Conference, 79850I (1 April 2011); doi: 10.1117/12.896909; https://doi.org/10.1117/12.896909
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