3 January 2011 Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography
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Proceedings Volume 7990, Optical Sensors and Biophotonics II; 799006 (2011) https://doi.org/10.1117/12.888450
Event: Asia Communications and Photonics Conference and Exhibition, 2010, Shanghai, Shanghai, China
Abstract
We present some novel periodic structures with different internal nanopatterns based on multi-exposure two-beam interference lithography. Two-dimensional quasi-crystal structures are fabricated with precisely control of exposure directions and doses as well as the total number of exposures. Experimental fabrication of microstructures are demonstrated and comparied with numerical simulations of intensity distributions. The size of the fabricated samples is around 1 square centimeter. The diffraction spectra of the fabricated samples are measured and tested. The experiment results show such a fabrication technology is very promising for making diverse large-area microstructures with complex internal nanopatterns.
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Yinbing Bai, Yinbing Bai, A. Ping Zhang, A. Ping Zhang, } "Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography", Proc. SPIE 7990, Optical Sensors and Biophotonics II, 799006 (3 January 2011); doi: 10.1117/12.888450; https://doi.org/10.1117/12.888450
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