7 February 2011 Formation of low-reflection multicrystalline silicon surface by laser-induced structuring for application on silicon solar cells
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Proceedings Volume 7994, LAT 2010: International Conference on Lasers, Applications, and Technologies; 79940V (2011) https://doi.org/10.1117/12.881756
Event: International Conference on Coherent and Nonlinear Optics (ICONO 2010) and International Conference on Lasers, Applications and Technologies (LAT 2010), 2010, Kazan, Russian Federation
Abstract
The formation of laser-induced structures on the multicrystalline silicon surface has been investigated. Optimum performances of the surface structurization have been explored. A cardinal decrease in reflectance from modified surface has been discovered in a wide spectral range in comparison with the samples of chemically texturized monocrystalline silicon. The influence of subsequent chemical etching on the reflection spectra of the texturized samples surface has been analyzed.
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D. A. Zuev, O. A. Novodvorsky, E. V. Khaydukov, O. D. Khramova, A. A. Lotin, L. S. Parshina, V. V. Rocheva, V. Ya. Panchenko, A. Yu. Poroykov, G. G. Untila, A. B. Chebotareva, T. N. Kost, M. A. Timofeev, "Formation of low-reflection multicrystalline silicon surface by laser-induced structuring for application on silicon solar cells", Proc. SPIE 7994, LAT 2010: International Conference on Lasers, Applications, and Technologies, 79940V (7 February 2011); doi: 10.1117/12.881756; https://doi.org/10.1117/12.881756
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