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18 February 2011 A high spatial resolution CsI:Tl scintillation film based on net-like substrate
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Proceedings Volume 7995, Seventh International Conference on Thin Film Physics and Applications; 79951P (2011) https://doi.org/10.1117/12.888355
Event: Seventh International Conference on Thin Film Physics and Applications, 2010, Shanghai, China
Abstract
CsI:Tl scintillation films were prepared on the net-like patterning substrates. The pattern of the substrates as well as the morphology of the CsI:Tl films were measured by SEM. The results show that the size of each grid on substrate is 55μm which is formed by SU-8 photoresist with 5μm in both height and width, and the CsI:Tl films display quite a good columnar structure. The spatial resolutions of X-ray imaging were taken by MTF measurement. The spatial frequency of the CsI:Tl films on patterned substrates can reach up to 10 lp/mm at the 10% level of MTF, which is twice higher than that of the CsI:Tl film on the substrate without patterning.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wei Zhang, Mu Gu, Dalin Yao, Xiaolin Liu, Shimin Huang, Bo Liu, and Chen Ni "A high spatial resolution CsI:Tl scintillation film based on net-like substrate", Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 79951P (18 February 2011); https://doi.org/10.1117/12.888355
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