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18 February 2011 Effect of deposition rate on the DUV/VUV reflectance of MgF2protected aluminum mirrors with e-beam evaporation
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Proceedings Volume 7995, Seventh International Conference on Thin Film Physics and Applications; 79952B (2011) https://doi.org/10.1117/12.888553
Event: Seventh International Conference on Thin Film Physics and Applications, 2010, Shanghai, China
Abstract
Aluminum mirrors were freshly fabricated under optimum conditions protected with MgF2 at various deposition rates which evaporated by e-beam. All the samples were deposited on fine polished fused silica substrate. The reflectance results were measured by Mcpherson Vuvas2000 spectrometer in DUV/VUV spectral region from 150nm to 350nm. The highest reflectance is chosen to 210nm, and the point of 160nm is also very important for the project, so the results of two points are detailed presented. The highest average reflectance is about 86.76% with the MgF2 deposition rate at 1.2nm/s. The effects of aging on the reflectance of the MgF2 protected aluminum mirrors are discussed.
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Tong-tong Wang and Jin-song Gao "Effect of deposition rate on the DUV/VUV reflectance of MgF2protected aluminum mirrors with e-beam evaporation", Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 79952B (18 February 2011); https://doi.org/10.1117/12.888553
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