28 February 2011 Ablation by short optical and x-ray laser pulses
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Proceedings Volume 7996, Fundamentals of Laser-Assisted Micro- and Nanotechnologies 2010; 79960T (2011) https://doi.org/10.1117/12.887429
Event: Fundamentals of Laser Assisted Micro- and Nanotechnologies 2010, 2010, St. Petersburg, Russian Federation
The paper is devoted to experimental and theoretical studies of ablation of condensed matter by optical (OL), extreme ultraviolet (EUV) and X-ray lasers (XRL). Results obtained at two different XRL are compared. The first XRL is collision Ag-plasma laser with pulse duration τL = 7 ps and energy of quanta hv=89.3 eV, while the second one is EUV free electron laser (EUV-FEL) and has parameters τL = 0.3 ps and energy of quanta 20.2 eV. It is shown that ablation thresholds for these XRL at LiF dielectric are approximately the same. A theory is presented which explains slow growth of ablated mass with fluence in case of XRL as a result of transition from spallative ablation near threshold to evaporative ablation at high fluencies. It is found that the metal irradiated by short pulse of OL remains in elastic state even in high shear stresses. Material strength of aluminum at very high deformation rates V/V ~ 109 s-1 is defined.
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N. A. Inogamov, N. A. Inogamov, S. I. Anisimov, S. I. Anisimov, V. V. Zhakhovsky, V. V. Zhakhovsky, A. Ya. Faenov, A. Ya. Faenov, Yu. V. Petrov, Yu. V. Petrov, V. A. Khokhlov, V. A. Khokhlov, V. E. Fortov, V. E. Fortov, M. B. Agranat, M. B. Agranat, S. I. Ashitkov, S. I. Ashitkov, P. S. Komarov, P. S. Komarov, I. Yu. Skobelev, I. Yu. Skobelev, Y. Kato, Y. Kato, T. A. Pikuz, T. A. Pikuz, V. V. Shepelev, V. V. Shepelev, Y. Fukuda, Y. Fukuda, M. Tanaka, M. Tanaka, M. Kishimoto, M. Kishimoto, M. Ishino, M. Ishino, M. Nishikino, M. Nishikino, M. Kando, M. Kando, T. Kawachi, T. Kawachi, M. Nagasono, M. Nagasono, H. Ohashi, H. Ohashi, M. Yabashi, M. Yabashi, K. Tono, K. Tono, Y. Senba, Y. Senba, T. Togashi, T. Togashi, T. Ishikawa, T. Ishikawa, } "Ablation by short optical and x-ray laser pulses", Proc. SPIE 7996, Fundamentals of Laser-Assisted Micro- and Nanotechnologies 2010, 79960T (28 February 2011); doi: 10.1117/12.887429; https://doi.org/10.1117/12.887429

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