Paper
26 May 2011 Investigation on phase compensation method for measurement of resistance of quartz crystal
Yanlin Wang, Zhongyu Wang, Dong Li, Guili Liu
Author Affiliations +
Proceedings Volume 7997, Fourth International Seminar on Modern Cutting and Measurement Engineering; 79971P (2011) https://doi.org/10.1117/12.891856
Event: Fourth International Seminar on Modern Cutting and Measuring Engineering, 2010, Beijing, China
Abstract
Resistance is one of four basic parameters of quartz crystal, and the others can be deducted from it. However, its strict requirements on fabrication technology for π network, and the phase shift induced by tray reactance and quartz crystal static capacitance, the highest accuracy measurements of resistance is difficult to be realized. Here, active compensation to additional-phase offset induced by stray reactance in π network and quartz crystal static capacitance (C0) is presented, which facilitates measurement of resistance of quartz crystal, and reduces the requirements of fabrication technology for π network. The experimental result indicates that the measurement accuracy of resistance R1 in quartz crystal can be up to ±5% with this measurement system.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yanlin Wang, Zhongyu Wang, Dong Li, and Guili Liu "Investigation on phase compensation method for measurement of resistance of quartz crystal", Proc. SPIE 7997, Fourth International Seminar on Modern Cutting and Measurement Engineering, 79971P (26 May 2011); https://doi.org/10.1117/12.891856
Lens.org Logo
CITATIONS
Cited by 3 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
Back to Top