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20 September 1976 Submicron X-Ray Lithography
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Abstract
We present results of our evaluation of the X-ray lithographic technique for replication of submicron patterns generated by electron beam. Mylar membranes have largely been employed as substrates for X-ray masks, although silicon substrates have also been used. Absorber patterns with high aspect ratio have been obtained by electroplating and by ion milling. Circuit patterns have been replicated with 0.25μm features in both positive and negative X-ray resists.
© (1976) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. K. Watts, D. C. Guterman, and H. M. Darley "Submicron X-Ray Lithography", Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); https://doi.org/10.1117/12.954840
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