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26 July 2011 Nanoring patterning using surface plasmon assisted photolithography
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Proceedings Volume 8001, International Conference on Applications of Optics and Photonics; 80011P (2011) https://doi.org/10.1117/12.894397
Event: International Conference on Applications of Optics and Photonics, 2011, Braga, Portugal
Abstract
Achievable resolution of nano-rings, fabricated using commonly employed conventional mask based photolithography, is limited by diffraction of light. In this work conventional photolithography is modified to incorporate the phenomenon of surface plasmons to overcome the diffraction limit and thus to fabricate nano rings. Here, an embedded-amplitude mask based surface plasmon lithography is numerically investigated to conceptalize a noval methodology to fabricate the proposed nano-ring structure. Results of FDTD simulation shows sharp transmission peaks at the hole edges which could be recorded using suitable thinned photoresist to obtain nano ring structures.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. Sidharthan, K. Sathiyamoorthy, and V. M. Murukeshan "Nanoring patterning using surface plasmon assisted photolithography", Proc. SPIE 8001, International Conference on Applications of Optics and Photonics, 80011P (26 July 2011); https://doi.org/10.1117/12.894397
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