21 October 2011 Polarimetry-based far-field method for high-resolution optical microscopy
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Proceedings Volume 8011, 22nd Congress of the International Commission for Optics: Light for the Development of the World; 80110V (2011); doi: 10.1117/12.902119
Event: International Commission for Optics (ICO 22), 2011, Puebla, Mexico
Abstract
We present a polarimetry-based far-field method for high-resolution optical microscopy. The method is based on the measurement of scattering-angle-resolved polarization state distributions across the exit pupil of a high numerical aperture objective lens and allows us to distinguish between different sub-resolution objects with no need for an active scanning. Our numerical and experimental results show that the scattering-angle-resolved polarization state distributions can be used in the characterization of particles and structures with features below or at the edge of the Rayleigh resolution limit.
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Oscar G. Rodríguez-Herrera, David Lara, Chris Dainty, "Polarimetry-based far-field method for high-resolution optical microscopy", Proc. SPIE 8011, 22nd Congress of the International Commission for Optics: Light for the Development of the World, 80110V (21 October 2011); doi: 10.1117/12.902119; https://doi.org/10.1117/12.902119
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KEYWORDS
Polarization

Objectives

Optical microscopy

Polarimetry

Dielectric polarization

Chromium

Finite-difference time-domain method

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