1 June 2011 Creating nanohole arrays with the helium ion microscope
Author Affiliations +
Helium Ion Microscopy has been established as a powerful imaging technique offering unique contrast and high resolution surface information. More recently, the helium ion beam has been used for nanostructuring applications similar to a gallium focused ion beam. A key difference between helium and gallium induced sputtering is the less intense damage cascade which lends this technique to precise and controlled milling of different materials enabling applications. The helium ion beam has been used for drilling 5nm holes in a 100nm gold foil (20:1 aspect ratio) while the gallium beam sputtered holes of a similar aspect ratio seem to be limited to a 50nm hole size. This paper explores the drilling of nanopores in gold films and other materials and offers an explanation for the observed differences in results between helium and gallium ions.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mohan Ananth, Mohan Ananth, Lewis Stern, Lewis Stern, David Ferranti, David Ferranti, Chuong Huynh, Chuong Huynh, John Notte, John Notte, Larry Scipioni, Larry Scipioni, Colin Sanford, Colin Sanford, Bill Thompson, Bill Thompson, } "Creating nanohole arrays with the helium ion microscope", Proc. SPIE 8036, Scanning Microscopies 2011: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences, 80360M (1 June 2011); doi: 10.1117/12.887497; https://doi.org/10.1117/12.887497


Contamination removal by ion sputtering
Proceedings of SPIE (October 31 1990)
Model for focused ion beam deposition
Proceedings of SPIE (April 30 1990)
The helium ion microscope: a new tool for nanomanufacturing
Proceedings of SPIE (September 27 2007)
Ion-Assisted Processes In Optical Thin Film Deposition
Proceedings of SPIE (December 22 1986)

Back to Top