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4 May 2011 Multilayer coatings for the far and extreme ultraviolet
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Abstract
We present the development of novel coatings for the far and extreme ultraviolet (FUV-EUV). In the EUV above ~50 nm, the strong absorption of materials has precluded the development of narrowband coatings. An extensive research has been performed on the search and characterization of new materials with low absorption; the lanthanide series has been found to be a source of materials with relatively low absorption in the range of interest. The discovery of a wealth of materials with relatively low EUV absorption is basic to develop efficient multilayers, particularly with narrowband properties. In this way, we have developed multilayers based on Yb, Al, and SiO with narrowband performance in the 50-92 nm range; these are first narrowband coatings peaked above 70 nm. Our recent research on multilayers based on Eu, Al, and SiO provide promising results, with an increase in the peak reflectance versus Yb/Al/SiO multilayers, along with a peak wavelength that can be extended up to ~100 nm. For applications where FUV-EUV narrowband coatings have not been able to be prepared, we can design multilayers that address specific purposes, such as maximizing the reflectance ratio at two wavelengths or bands. Our first goal in this direction is the development of coatings with high 102.6 nm/ 121.6 nm reflectance ratio. Calculations predict that a high reflectance at Lyman β with a good rejection at Lyman α can be obtained through multilayer coatings. We are at the beginning of experimental research for this goal.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Juan I. Larruquert, Manuela Vidal-Dasilva, Sergio García-Cortés, Luis Rodríguez-de Marcos, Mónica Fernández-Perea, José A. Aznárez, and José A. Méndez "Multilayer coatings for the far and extreme ultraviolet", Proc. SPIE 8076, EUV and X-Ray Optics: Synergy between Laboratory and Space II, 80760D (4 May 2011); https://doi.org/10.1117/12.886856
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