Measurement of characteristics of a XUV capillary laser

J. Novak; M. Nevrkla; A. Jancarek

doi:10.1117/12.886758

4 May 2011 Measurement of characteristics of a XUV capillary laser

J. Novak, M. Nevrkla, A. Jancarek

Proceedings Volume 8076, EUV and X-Ray Optics: Synergy between Laboratory and Space II; 80760L (2011) https://doi.org/10.1117/12.886758
Event: SPIE Optics + Optoelectronics, 2011, Prague, Czech Republic

Abstract

This work concerns in measurement of characteristics of a XUV argon capillary laser, which was developed at the Czech Technical University in Prague, Faculty of Nuclear Sciences and Physical Engineering. This laser generates at 46.9 nm in Ne - like Ar. Young's double pinhole experiment was realized to estimate spatial coherence of this laser system and to detect the beam profile. We used double pinholes drilled by Ti:saphire laser with four different pinhole separations. pinhole separations were 50 μm, 60 μ m, 100 μm and 150 μm. Apertures had oval shape with diameter 20 - 25 μ m. Interference structure was detected by XUV CCD camera with resolution 512x512 pixels. This work contains also short overview about sources of XUV radiation.

Citation Download Citation

J. Novak, M. Nevrkla, and A. Jancarek "Measurement of characteristics of a XUV capillary laser", Proc. SPIE 8076, EUV and X-Ray Optics: Synergy between Laboratory and Space II, 80760L (4 May 2011); https://doi.org/10.1117/12.886758

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