Freestanding multilayer films for application as phase retarders and spectral purity filters in the soft x-ray and EUV ranges

N. I. Chkhalo; M. N. Drozdov; S. A. Gusev; E. B. Kluenkov; A. Ya. Lopatin; V. I. Luchin; N. N. Salashchenko; L. A. Shmaenok; N. N. Tsybin; B. A. Volodin

doi:10.1117/12.886781

4 May 2011 Freestanding multilayer films for application as phase retarders and spectral purity filters in the soft x-ray and EUV ranges

N. I. Chkhalo, M. N. Drozdov, S. A. Gusev, E. B. Kluenkov, A. Ya. Lopatin, V. I. Luchin, N. N. Salashchenko, L. A. Shmaenok, N. N. Tsybin, B. A. Volodin

Author Affiliations +

Proceedings Volume 8076, EUV and X-Ray Optics: Synergy between Laboratory and Space II; 80760O (2011) https://doi.org/10.1117/12.886781
Event: SPIE Optics + Optoelectronics, 2011, Prague, Czech Republic

Abstract

A technique for fabrication of freestanding multilayers which are able to be used as optical elements in the soft X-ray and EUV ranges is reported. Two types of transmission mode elements have been developed: phase retarders for the aims of soft X-ray polarimetry and thin film spectral filters. A variety of phase retarders on the base of Cr/Sc, Cr/C, V/B4C and W/B₄C freestanding multilayers were designed for a spectral region of "water window" (λ≈ 2-4.5nm) 2 - 4.5 nm). The possibility to yield the phase shift between s- and p-polarizations as high as 90º at equal transparencies of these polarizations of 0.4% was experimentally demonstrated with Cr/Sc phase retarder close to the Sc L-edge of absorption (λ = 3.11 nm). The set of freestanding absorption filters Cr/Sc, Mo/C, Zr/Si, Zr/Al with spectral windows within 2.2 to 22 nm wavelength range was developed for the aims of hot plasma diagnostics. We also fabricated Al/Si structures with supported mesh, which are transparent in the range λ = 17 - 60 nm, for application in the sun astronomy. The sample of 160 mm in diameter Mo/ZrSi2 spectral purity filters with transparency of 70% (λ = 13 nm) was fabricated as the probable component part of industrial EUV lithography tool. The preliminary testing of heat load withstandability was fulfilled for a number of freestanding multilayers consisting of Si, Zr, Mo and silicides of both metals. It was found that Mo/ZrSi₂ structure is the challenge to withstand intensive heating up to 800 - 850°C.

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N. I. Chkhalo, M. N. Drozdov, S. A. Gusev, E. B. Kluenkov, A. Ya. Lopatin, V. I. Luchin, N. N. Salashchenko, L. A. Shmaenok, N. N. Tsybin, and B. A. Volodin "Freestanding multilayer films for application as phase retarders and spectral purity filters in the soft x-ray and EUV ranges", Proc. SPIE 8076, EUV and X-Ray Optics: Synergy between Laboratory and Space II, 80760O (4 May 2011); https://doi.org/10.1117/12.886781

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