Translator Disclaimer
18 May 2011 Blistering behavior in Mo/Si multilayers
Author Affiliations +
This paper is concerned with mapping the characteristics of blistering induced on Mo/Si multilayers as a result of irradiation by hydrogen species generated in a thermal capillary cracker. The nature and extent of the damage observed is dependent on exposure conditions such as the sample temperature, the hydrogen isotope used and the total fluence. Increasing the sample temperature leads to fewer but larger blisters. When D2 is used as the working gas, blisters are ~5 times smaller in diameter than in the case of H2 exposure, but more blisters are formed. Increasing the gas flow induces more and bigger blisters and blisters were observed to develop in two distinct size distributions.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. S. Kuznetsov, M. A. Gleeson, R. W. E. van de Kruijs, and F. Bijkerk "Blistering behavior in Mo/Si multilayers", Proc. SPIE 8077, Damage to VUV, EUV, and X-ray Optics III, 807713 (18 May 2011); doi: 10.1117/12.887326;

Back to Top