23 May 2011 Ablation of ionic crystals induced by capillary-discharge XUV laser
Author Affiliations +
Proceedings Volume 8077, Damage to VUV, EUV, and X-ray Optics III; 807719 (2011); doi: 10.1117/12.890406
Event: SPIE Optics + Optoelectronics, 2011, Prague, Czech Republic
Single crystals of two fluorides (LiF and CaF2) and a tungstate (PbWO4) were irradiated by nanosecond pulses of 46.9- nm radiation provided by 10-Hz capillary-discharge Ne-like Ar laser (CDL). The damage threshold was determined in LiF using the CDL beam focused by a Sc/Si multilayer-coated spherical mirror. Irradiated samples have been investigated by Nomarski (DIC - Differential Interference Contrast) microscopy and optical (WLI - white light intereferometry) profiler. After an exposure by a certain number of CDL pulses, an ablation rate can be calculated from WLI measured depth of the crater created by the XUV ablation. Potential use of XUV ablation of ionic crystals in pulsed laser deposition (PLD) of thin layers of such a particular material, which is difficult to ablate by conventional UV-Vis- NIR lasers, is discussed in this contribution.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Peter Pira, Tomáš Burian, Ludék Vyšín, Jaromír Chalupský, Ján Lančok, Jan Wild, Michal Střižík, Zdeněk Zelinger, Jorge J Rocca, Libor Juha, "Ablation of ionic crystals induced by capillary-discharge XUV laser", Proc. SPIE 8077, Damage to VUV, EUV, and X-ray Optics III, 807719 (23 May 2011); doi: 10.1117/12.890406; https://doi.org/10.1117/12.890406

Extreme ultraviolet

Laser induced fluorescence

Laser ablation


Laser crystals

Pulsed laser deposition



KTN-based electro-optic beam scanner
Proceedings of SPIE (November 18 2008)
Ablation by short optical and x-ray laser pulses
Proceedings of SPIE (February 28 2011)
Growth of oxide thin films by laser ablation
Proceedings of SPIE (September 07 1994)

Back to Top