27 May 2011 AFM nanometrology interferometric system with the compensation of angle errors
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Abstract
The contribution is oriented towards measuring in the nanoscale through local probe microscopy techniques, primarily the AFM microscopy. The need to make the AFM microscope a nanometrology tool not only the positioning of the tip has to be based on precise measurements but the traceability of the measuring technique has to be ensured up to the primary standard. This leads to the engagement of laser interferometric measuring methods. We present a improved design of the six-axes dimensional interferometric measurement tool for local probe microscopy stage nanopositioning with the compensation system of angle errors. The setup is powered with the help of a single-frequency frequency-doubled Nd:YAG laser which is stabilized by thermal frequency control locked to a Doppler-broadened absorption line in iodine. The laser stabilization technique is described together with comparison of frequency stability and angle errors compensation system performance.
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Jan Hrabina, Josef Lazar, Petr Klapetek, Ondrej Cip, "AFM nanometrology interferometric system with the compensation of angle errors", Proc. SPIE 8082, Optical Measurement Systems for Industrial Inspection VII, 80823U (27 May 2011); doi: 10.1117/12.889544; https://doi.org/10.1117/12.889544
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