23 September 2011 Advanced holographic methods in extreme ultraviolet interference lithography
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Proceedings Volume 8102, Nanoengineering: Fabrication, Properties, Optics, and Devices VIII; 81020V (2011); doi: 10.1117/12.893733
Event: SPIE NanoScience + Engineering, 2011, San Diego, California, United States
Abstract
We study the formation of complex pattern geometries and beam shapes in diffraction-based extreme ultraviolet interference lithography. In particular, we demonstrate numerically as well as experimentally the potential of interfering multiple beams with well-controlled relative phase relations for the fabrication of high resolution periodic and quasiperiodic nanostructures.
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Bernd Terhalle, Andreas Langner, Birgit Päivänranta, Yasin Ekinci, "Advanced holographic methods in extreme ultraviolet interference lithography", Proc. SPIE 8102, Nanoengineering: Fabrication, Properties, Optics, and Devices VIII, 81020V (23 September 2011); doi: 10.1117/12.893733; https://doi.org/10.1117/12.893733
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KEYWORDS
Extreme ultraviolet

Photomasks

Diffraction gratings

Lithography

Nanostructures

Computer simulations

Diffraction

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