26 September 2011 Tungsten nanostructured thin films obtained via HFCVD
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By using the Hot Filament Chemical Vapor Deposition (HFCVD) technique tungsten thin films were deposited on amorphous quartz substrates. To achieve this, a tungsten filament was heated at 1300 °C during 30 minutes maintaining a constant pressure inside the chamber at 460 mTorr and substrate at 700 °C. Transition from tungsten oxide deposits to tungsten thin films, by varying the substrate temperature, were characterized by means of Scanning Electron Microscope (SEM), Atomic Force Microscope (AFM), X-Ray Diffraction and, micro-Raman spectroscopy. The SEM micrographs reveal that the tungsten films have no more than 200 nm in thickness while XRD show evidence of the films crystallize in the á-tungsten modification. On the other hand, AFM shows that the tungsten thin films exhibit a uniform and smooth surface composed with semi-spherical shapes whose diameters are below than 50 nm. Furthermore, to the naked eye, the as-deposited tungsten films exhibit a high mirror-like appearance.
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O. Goiz, O. Goiz, F. Chávez, F. Chávez, P. Zaca-Morán, P. Zaca-Morán, J. G. Ortega-Mendoza, J. G. Ortega-Mendoza, G. F. Pérez-Sánchez, G. F. Pérez-Sánchez, N. Morales, N. Morales, C. Felipe, C. Felipe, R. Peña-Sierra, R. Peña-Sierra, } "Tungsten nanostructured thin films obtained via HFCVD", Proc. SPIE 8104, Nanostructured Thin Films IV, 810415 (26 September 2011); doi: 10.1117/12.893850; https://doi.org/10.1117/12.893850

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