Sidewall slope sensitivity of CD-AFM

Aaron Cordes; Benjamin Bunday; Eric Cottrell

doi:10.1117/12.896344

20 September 2011 Sidewall slope sensitivity of CD-AFM

Aaron Cordes, Benjamin Bunday, Eric Cottrell

Proceedings Volume 8105, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors V; 810506 (2011) https://doi.org/10.1117/12.896344
Event: SPIE NanoScience + Engineering, 2011, San Diego, California, United States

Abstract

In this paper, we explore the sensitivity of three-dimensional atomic force microscopy to incremental variation in the sidewall angle of near-vertical features. Measurement results are presented from a specially constructed wafer with continuous variation in sidewall slope across a range of angles just above and below vertical. This sample was scanned with a variety of both tip shapes and sizes using two different scan modes. From the results, we are able to derive cutoff limits for measuring near-vertical angles using aggressive scanning modes and the relative biases of different modes and tips in measuring a range of sidewall angles. This provides information about the measurement limitations of differing instrument configurations, each configuration consisting of a combination of tip and scan mode and sensitivity demarcated in terms of the ability to detect changes in the slope and relative accuracy of the measurement.

Citation Download Citation

Aaron Cordes, Benjamin Bunday, and Eric Cottrell "Sidewall slope sensitivity of CD-AFM", Proc. SPIE 8105, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors V, 810506 (20 September 2011); https://doi.org/10.1117/12.896344

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