17 September 1987 Bilevel System HPR/PMMA
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Proceedings Volume 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection; (1987) https://doi.org/10.1117/12.975608
Event: Fourth International Symposium on Optical and Optoelectronic Applied Sciences and Engineering, 1987, The Hague, Netherlands
Abstract
A two layers HPR/PMMA lithographic process is developped in order to overcome the limitations of the single layer scheme when over aluminium steps. Results of PMMA coating and step coverage, HPR patterning, descum of the interfacial layer, image development are presented and discussed in terms of material properties.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andre P. Weill, Andre P. Weill, Elisabeth C. Dechenaux, Elisabeth C. Dechenaux, Patrick J. Paniez, Patrick J. Paniez, Gilles R. Amblard, Gilles R. Amblard, } "Bilevel System HPR/PMMA", Proc. SPIE 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection, (17 September 1987); doi: 10.1117/12.975608; https://doi.org/10.1117/12.975608
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