Preparation of BaTiO3 thin films by double-pulse-lasers deposition

Abdalla M. Darwish; Simeon Wilson; Hadi Alkahby; Brent Koplitz

doi:10.1117/12.893185

16 September 2011 Preparation of BaTiO₃ thin films by double-pulse-lasers deposition

Abdalla M. Darwish, Simeon Wilson, Hadi Alkahby, Brent Koplitz

Proceedings Volume 8120, Photonic Fiber and Crystal Devices: Advances in Materials and Innovations in Device Applications V; 812009 (2011) https://doi.org/10.1117/12.893185
Event: SPIE Photonic Devices + Applications, 2011, San Diego, California, United States

Abstract

Epitaxial BaTiO₃ films were deposited by using innovative double-pulse--lasers Deposition (DPLD) technique. The modified DPLD enables the ablation of batio3 thin film to be doped with Fe and Mn in situ during the ablation process. Different substrates were used like MgO, SrTiO₃, and Si to decrease the misfit with BaTiO₃. The films deposited at different substrate-temperature in the range of 200°C-800°C. The thin film surface morphology was investigated using both Atomic Force Microscope (AFM) and Reflection high Energy Electron Diffraction (RHEED). The substrate temperature and the oxygen gas pressure affected the morphology of the thin film and in turn the optical response of the thin film. The AFM reviled a new harmonic grating structure of the thin film due to the DPLD ablation. The thin film shows an anomalous response to the HeNe laser as a self-modulation and grating formation pattern were observed.

Citation Download Citation

Abdalla M. Darwish, Simeon Wilson, Hadi Alkahby, and Brent Koplitz "Preparation of BaTiO₃ thin films by double-pulse-lasers deposition", Proc. SPIE 8120, Photonic Fiber and Crystal Devices: Advances in Materials and Innovations in Device Applications V, 812009 (16 September 2011); https://doi.org/10.1117/12.893185

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