27 September 2011 Manufacturing process optimization of phase plates for depth extension microscopy systems
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Abstract
Extended depth of field (EDoF) technology can be applied to imaging systems by merging phase-coding design and digital signal processing. This paper presents an application of EDoF to the microscope platform and shows the capability to capture EDoF images in a single shot. Ultra-precision machining conditions for a phase-coding component were compared the peak-to-valley (P-V) error of the cubic surface with the performance of the EDoF. For the phase variation is very small for this phase plate, determining the optimal cutting condition at which the quality of phase plate is stabilized is very important. Therefore, the single point diamond turning (SPDT) was used to manufacture the optical components for its high precision. And the results are as following, the accuracy of non-symmetric phase plate found between 0.4 μm and 1μm had better performance of the EDoF image. Overall, the depth of field of the new objective could be increased more than five times compared to an objective having no such phase plate. The purpose of this study is to compare the relationship between PV error of phase plate surface and imaging restoration quality, which maybe a good benchmark in this field.
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Chih-Cheng Hsu, Hsin-Yueh Sung, Yung-Lin Chen, Chuan-Chung Chang, Chir-Weei Chang, Wen-Hung Cheng, and Chin-Tsia Liang "Manufacturing process optimization of phase plates for depth extension microscopy systems", Proc. SPIE 8126, Optical Manufacturing and Testing IX, 81261A (27 September 2011); doi: 10.1117/12.892464; https://doi.org/10.1117/12.892464
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