28 September 2011 Characterization of a 20-nm hard x-ray focus by ptychographic coherent diffractive imaging
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Recent advances in the fabrication of diffractive X-ray optics have boosted hard X-ray microscopy into spatial resolutions of 30 nm and below. Here, we demonstrate the fabrication of zone-doubled Fresnel zone plates for multi-keV photon energies (4-12 keV) with outermost zone widths down to 20 nm. However, the characterization of such elements is not straightforward using conventional methods such as knife edge scans on well-characterized test objects. To overcome this limitation, we have used ptychographic coherent diffractive imaging to characterize a 20 nm-wide X-ray focus produced by a zone-doubled Fresnel zone plate at a photon energy of 6.2 keV. An ordinary scanning transmission X-ray microscope was modified to acquire the ptychographic data from a strongly scattering test object. The ptychographic algorithms allowed for the reconstruction of the image of the test object as well as for the reconstruction of the focused hard X-ray beam waist, with high spatial resolution and dynamic range. This method yields a full description of the focusing performance of the Fresnel zone plate and we demonstrate the usefulness ptychographic coherent diffractive imaging for metrology and alignment of nanofocusing diffractive X-ray lenses.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joan Vila-Comamala, Joan Vila-Comamala, Ana Diaz, Ana Diaz, Manuel Guizar-Sicairos, Manuel Guizar-Sicairos, Sergey Gorelick, Sergey Gorelick, Vitaliy A. Guzenko, Vitaliy A. Guzenko, Petri Karvinen, Petri Karvinen, Cameron M. Kewish, Cameron M. Kewish, Elina Färm, Elina Färm, Mikko Ritala, Mikko Ritala, Alexandre Mantion, Alexandre Mantion, Oliver Bunk, Oliver Bunk, Andreas Menzel, Andreas Menzel, Christian David, Christian David, "Characterization of a 20-nm hard x-ray focus by ptychographic coherent diffractive imaging", Proc. SPIE 8139, Advances in X-Ray/EUV Optics and Components VI, 81390E (28 September 2011); doi: 10.1117/12.893235; https://doi.org/10.1117/12.893235


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