Paper
28 September 2011 The influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers
Y. P. Pershyn, E. M. Gullikson, I. A. Artyukov, V. V. Kondratenko, V. A. Sevryukova, D. L. Voronov, E. N. Zubarev, A. V. Vinogradov
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Abstract
Impact of Ar gas pressure (1-4 mTorr) on the growth of amorphous interlayers in Mo/Si multilayers deposited by magnetron sputtering was investigated by small-angle x-ray scattering (λ=0.154 nm) and methods of cross-sectional transmission electron microscopy. Some reduction of thickness of the amorphous inter-layers with Ar pressure increase was found, while composition of the layers was enriched with molybdenum. The interface modification resulted in raise of EUV reflectance of the Mo/Si multilayers.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Y. P. Pershyn, E. M. Gullikson, I. A. Artyukov, V. V. Kondratenko, V. A. Sevryukova, D. L. Voronov, E. N. Zubarev, and A. V. Vinogradov "The influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers", Proc. SPIE 8139, Advances in X-Ray/EUV Optics and Components VI, 81390N (28 September 2011); https://doi.org/10.1117/12.892324
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KEYWORDS
Molybdenum

Interfaces

Argon

Reflectivity

Silicon

Extreme ultraviolet

Sputter deposition

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