The effect of surface residual stress on the performance of high quality x-ray mirrors

J. Maj; G. Navrotski; X. Huang; L. Assoufid; R. Khachatryan; J. Qian; M. Wieczorek

doi:10.1117/12.894082

28 September 2011 The effect of surface residual stress on the performance of high quality x-ray mirrors

J. Maj, G. Navrotski, X. Huang, L. Assoufid, R. Khachatryan, J. Qian, M. Wieczorek

Author Affiliations +

Proceedings Volume 8139, Advances in X-Ray/EUV Optics and Components VI; 81390X (2011) https://doi.org/10.1117/12.894082
Event: SPIE Optical Engineering + Applications, 2011, San Diego, California, United States

Abstract

The use of high quality X-ray mirrors at synchrotron beamlines as low-energy bandpass, harmonic rejection and high heat load optical elements has become routine. Nearly perfect optical surfaces generated on substrates and held in strain-free fixtures are of paramount importance to their success. Production of these mirrors requires extensive care, yet the effect of residual fabrication stress has not been closely studied. This paper examines the effect of surface and near-surface residual stress on the performance of hard X-ray mirrors using topography and X-ray reflectivity techniques. The present approach complements the information provided by standard optical metrology, giving a more comprehensive understanding of polishing induced surface deformation on X-ray reflectivity. This information is invaluable for the characterization of future, coherence preserving optics where scattering and evanescent sub-surface X-ray penetration may impact beam quality.

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J. Maj, J. Maj, G. Navrotski, G. Navrotski, X. Huang, X. Huang, L. Assoufid, L. Assoufid, R. Khachatryan, R. Khachatryan, J. Qian, J. Qian, M. Wieczorek, M. Wieczorek, } "The effect of surface residual stress on the performance of high quality x-ray mirrors", Proc. SPIE 8139, Advances in X-Ray/EUV Optics and Components VI, 81390X (28 September 2011); doi: 10.1117/12.894082; https://doi.org/10.1117/12.894082

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