Mask Metrology I
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PPF-Explorer: pointwise proximity function calibration using a new radial symmetric calibration structure
Application of signal reconstruction techniques to shot count reduction in simulation driven fracturing
Study on design rule verification procedure of semiconductor memory devices by using design based metrology (DBM)
Holistic lithography for EUV: NXE:3100 characterization of first printed wafers using an advanced scanner model and scatterometry
Investigation of 3D patterns on EUV masks by means of scatterometry and comparison to numerical simulations
The assessment of the impact of mask pattern shape variation on the OPC-modeling by using SEM-contours from wafer and mask