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13 October 2011 Mask Industry Assessment: 2011
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A survey supported by SEMATECH and administered by David Powell Consulting was sent to microelectronics industry leaders to gather information about the mask industry as an objective assessment of its overall condition. The survey was designed with the input of semiconductor company mask technologists and merchant mask suppliers. This year's assessment is the tenth in the current series of annual reports. With ongoing industry support, the report has been used as one of the baselines to gain perspective on the technical and business status of the mask and microelectronics industries. It continues to serve as a valuable reference to identify the strengths and opportunities of the mask industry. The results will be used to guide future investments pertaining to critical path issues. This year's survey was essentially the same as the 2005 through 2010 surveys. Questions are grouped into following categories: General Business Profile Information, Data Processing, Yields and Yield Loss Mechanisms, Delivery Times, Returns, and Services. Within each category are multiple questions that result in a detailed profile of both the business and technical status of the critical mask industry. This profile combined with the responses to past surveys represents a comprehensive view of changes in the industry.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Y. David Chan "Mask Industry Assessment: 2011", Proc. SPIE 8166, Photomask Technology 2011, 81660D (13 October 2011);


The 2002 to 2010 mask survey trend analysis
Proceedings of SPIE (March 16 2011)
Mask industry assessment trend analysis
Proceedings of SPIE (May 27 2009)
Mask industry assessment: 2008
Proceedings of SPIE (October 16 2008)
Mask Industry Assessment: 2007
Proceedings of SPIE (October 22 2007)
Mask industry assessment: 2009
Proceedings of SPIE (September 29 2009)
Mask industry assessment: 2002
Proceedings of SPIE (December 26 2002)
Mask industry assessment: 2003
Proceedings of SPIE (December 16 2003)

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