13 October 2011 Double patterning from design enablement to verification
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Litho-etch-litho-etch (LELE) is the double patterning (DP) technology of choice for 20 nm contact, via, and lower metal layers. We discuss the unique design and process characteristics of LELE DP, the challenges they present, and various solutions. ○ We examine DP design methodologies, current DP conflict feedback mechanisms, and how they can help designers identify and resolve conflicts. ○ In place and route (P&R), the placement engine must now be aware of the assumptions made during IP cell design, and use placement directives provide by the library designer. We examine the new effects DP introduces in detail routing, discuss how multiple choices of LELE and the cut allowances can lead to different solutions, and describe new capabilities required by detail routers and P&R engines. ○ We discuss why LELE DP cuts and overlaps are critical to optical process correction (OPC), and how a hybrid mechanism of rule and model-based overlap generation can provide a fast and effective solution. ○ With two litho-etch steps, mask misalignment and image rounding are now verification considerations. We present enhancements to the OPCVerify engine that check for pinching and bridging in the presence of DP overlay errors and acute angles.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David Abercrombie, David Abercrombie, Pat Lacour, Pat Lacour, Omar El-Sewefy, Omar El-Sewefy, Alex Volkov, Alex Volkov, Evgueni Levine, Evgueni Levine, Kellen Arb, Kellen Arb, Chris Reid, Chris Reid, Qiao Li, Qiao Li, Pradiptya Ghosh, Pradiptya Ghosh, } "Double patterning from design enablement to verification", Proc. SPIE 8166, Photomask Technology 2011, 81660X (13 October 2011); doi: 10.1117/12.898895; https://doi.org/10.1117/12.898895


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