13 October 2011 Enhancement of global CD correction and data processing in EB mask writer EBM-8000
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We report our development of fogging effect correction method aimed for EBM-8000, our newest series of EB mask writers for mask production of 22nm half-pitch generation and for mask development of 16nm half-pitch generation. We refined the method of fogging effect correction by taking account of dose modulation for proximity effects correction and loading effect correction into fogging effect correction, greatly reducing theoretical error. Writing experiment has shown that our method based on the threshold dose model is effective, though deviation from the model is observed.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hiroshi Matsumoto, Hiroshi Matsumoto, Yasuo Kato, Yasuo Kato, Tomoo Motosugi, Tomoo Motosugi, Jun Yashima, Jun Yashima, Takayuki Abe, Takayuki Abe, Noriaki Nakayamada, Noriaki Nakayamada, Shusuke Yoshitake, Shusuke Yoshitake, Kiyoshi Hattori, Kiyoshi Hattori, } "Enhancement of global CD correction and data processing in EB mask writer EBM-8000", Proc. SPIE 8166, Photomask Technology 2011, 816620 (13 October 2011); doi: 10.1117/12.898846; https://doi.org/10.1117/12.898846

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