13 October 2011 Determination of CD variance factors of 28nm 1x-metal layer hotspots using experimental and simulated CD contours
Author Affiliations +
Abstract
The 28nm technology node is extremely challenging for the production of large chips with very aggressive design rules. For the 1x-Metal layers especially, it has been observed that some design configurations known as hotspots have very limited lithographic process window. They have generally complex bidimensional geometries that make them highly sensitive to any process change and particularly to focus variation or mask error. The first purpose of this study is to present an original methodology to characterize, with good statistics, the hotspots after lithography. The principle is to stack many SEM pictures of the same hotspot, repeated on the wafer, to improve the image signal-to-noise ratio and to average uncontrolled sources of CD variation. With such high quality images it is then possible to extract contours of high accuracy. The second scope of this work is to take advantage of the extracted contours to derive many CD measured preferentially along the hotspot critical sections. The main contributors to CD variation are identified by analyzing the CD of hotspots processed under different experimental conditions like intra-field locations, mask sizing or focus changes.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Francois Weisbuch, Francois Weisbuch, Jessy Schramm, Jessy Schramm, } "Determination of CD variance factors of 28nm 1x-metal layer hotspots using experimental and simulated CD contours", Proc. SPIE 8166, Photomask Technology 2011, 81663G (13 October 2011); doi: 10.1117/12.897126; https://doi.org/10.1117/12.897126
PROCEEDINGS
16 PAGES


SHARE
RELATED CONTENT

Wafer weak point detection based on aerial images or WLCD
Proceedings of SPIE (October 23 2015)
Aerial image measuring system at 193 nm a tool...
Proceedings of SPIE (December 06 2004)
Evaluation of OPC efficacy
Proceedings of SPIE (June 07 1996)
Some challenges for mask making to keep up with the...
Proceedings of SPIE (December 18 1998)
Smart data filtering for enhancement of model accuracy
Proceedings of SPIE (March 16 2009)

Back to Top