Application of global optimization algorithms for optical thin film index determination from spectro-photometric analysis

Lihong Gao; Fabien Lemarchand; Michel Lequime

doi:10.1117/12.896832

4 October 2011 Application of global optimization algorithms for optical thin film index determination from spectro-photometric analysis

Lihong Gao, Fabien Lemarchand, Michel Lequime

Author Affiliations +

Proceedings Volume 8168, Advances in Optical Thin Films IV; 81680B (2011) https://doi.org/10.1117/12.896832
Event: SPIE Optical Systems Design, 2011, Marseille, France

Abstract

A large number of parameters is often required to describe optical dispersion laws, and it is only through the use of an appropriate global optimization procedure that an accurate thin film index determination can be achieved. In this paper, we propose to investigate the respective performances of three different optimization algorithms, namely Simulated Annealing, Genetic Algorithm and Clustering Global Optimization and compare results with a commercial software dedicated to thin film index determination. This study refers to the single layer and multilayer thin film index determination. It includes the theoretical study of simulated reflection and transmission spectra, and the experimental characterization of Ta₂O₅ single layer and Ta₂O₅/SiO₂ multilayer.

Citation Download Citation

Lihong Gao, Fabien Lemarchand, and Michel Lequime "Application of global optimization algorithms for optical thin film index determination from spectro-photometric analysis", Proc. SPIE 8168, Advances in Optical Thin Films IV, 81680B (4 October 2011); https://doi.org/10.1117/12.896832

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