3 October 2011 EUV reflectivity and stability of tri-component Al-based multilayers
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Abstract
We report on further development of three-material multilayer coatings made with a use of aluminum for the extreme ultra-violet (EUV) applications such as solar physics, high-order harmonic generation or synchrotron radiation. It was found that an introduction of refractory metal in Al-based periodic stack helps to reduce significantly an interfacial roughness and provides for a higher theoretical reflectance in the spectral range from 17 to 40 nm. The normal incidence reflectivity as high as 55 % at 17 nm, 50 % at 21 nm and 42 % at 30 nm was achieved with the new Al/Mo/SiC and Al/Mo/B4C multilayer mirrors, which have been optimized, fabricated and characterized with x-rays and synchrotron radiation. A good temporal and thermal stability of the tri-component Al-based multilayers has been observed over 3 years.
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E. Meltchakov, E. Meltchakov, A. Ziani, A. Ziani, F. Auchere, F. Auchere, X. Zhang, X. Zhang, M. Roulliay, M. Roulliay, S. De Rossi, S. De Rossi, Ch. Bourassin-Bouchet, Ch. Bourassin-Bouchet, A. Jérome, A. Jérome, F. Bridou, F. Bridou, F. Varniere, F. Varniere, F. Delmotte, F. Delmotte, } "EUV reflectivity and stability of tri-component Al-based multilayers", Proc. SPIE 8168, Advances in Optical Thin Films IV, 816819 (3 October 2011); doi: 10.1117/12.896577; https://doi.org/10.1117/12.896577
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