6 December 2011 HfO2/SiO2 enhanced diamond turned aluminum mirrors for IR laser optics
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Abstract
HfO2/SiO2 multilayers were deposited on single point diamond turned aluminum substrates via modified reactive plasma ion assisted deposition to form a laser durable and environmentally stable dielectric enhanced IR mirror at a wavelength of 1064nm. The effect of the surface quality of the diamond turned aluminum on the optical performance of the dielectric enhanced mirror was assessed. A laser-induced damage threshold up to 11 J/cm2 was obtained from the enhanced aluminum mirror tested in pulse mode at 1064nm with a pulse length of 20ns and a repetition rate of 20Hz. Laser damage morphology was revealed by a scanning electron microscopy. The damage mechanism was attributed to nodule defects generated by particle embedded on the aluminum substrate surface.
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Jue Wang, Ronald W. Davis, Angela Q Wang, Horst Schreiber, Scott J. Wilkinson, Joseph C. Crifasi, Robert D. Felock, "HfO2/SiO2 enhanced diamond turned aluminum mirrors for IR laser optics", Proc. SPIE 8190, Laser-Induced Damage in Optical Materials: 2011, 819005 (6 December 2011); doi: 10.1117/12.900226; https://doi.org/10.1117/12.900226
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