6 December 2011 Analysis of microstructure heights error of multilayer diffractive optical elements for far infrared optical system
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Proceedings Volume 8197, 2011 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments; 81970D (2011); doi: 10.1117/12.904799
Event: International Conference on Optical Instruments and Technology (OIT2011), 2011, Beijing, Beijing, China
Abstract
In this paper, the effect of the relative microstructure heights error on the diffraction efficiency of multilayer diffractive optical elements (MLDOEs) is considered. Based on the relationship of diffraction efficiency and diffractive microstructure height, the analysis result of the relative microstructure height error on the diffraction efficiency of MLDOEs for 8-14μm far infrared optical system was present. It is shown that the diffraction efficiency over the whole waveband is above 98.94% for double-layer DOEs when the two relative microstructure heights error are equal and both controlled within ±2%. However, the diffraction efficiency drops quickly when the two relative microstructure heights error changed in the opposite sign. The analysis result can be used for analyzing the effects of microstructure heights error on diffraction efficiency for MLDOEs working in infrared optical system.
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Liangliang Yang, Qingfeng Cui, Changxi Xue, Tao Liu, "Analysis of microstructure heights error of multilayer diffractive optical elements for far infrared optical system", Proc. SPIE 8197, 2011 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments, 81970D (6 December 2011); doi: 10.1117/12.904799; https://doi.org/10.1117/12.904799
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KEYWORDS
Diffraction

Error analysis

Diffractive optical elements

Far infrared

Infrared radiation

Manufacturing

Germanium

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