5 December 2011 Impact of the pattern layout on the performance of photonic crystal Fano broadband reflectors
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Proceedings Volume 8198, 2011 International Conference on Optical Instruments and Technology: Optoelectronic Devices and Integration; 819806 (2011) https://doi.org/10.1117/12.903954
Event: International Conference on Optical Instruments and Technology (OIT2011), 2011, Beijing, Beijing, China
Abstract
We report the impact of the pattern layout on the performance of Fano broadband reflectors based on 2D photonic crystals (PCs) on silicon-on-insulator. Two representative PC patterns including hexagonal and square are fairly compared with same buried oxide (BOX) layer thickness and equivalent refractive index of silicon layer by using 3D FDTD technique. Both red- and blue- spectral shifts are demonstrated with either addition of oxide on top, and/or selective etching of the BOX below. The hexagonal pattern can offer larger bandwidth with a bit lower reflectance as compared to square one. Additionally, it is more sensitive to etching thickness.
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Zhiyong Chen, Zhiyong Chen, Zexuan Qiang, Zexuan Qiang, Xiaofu Xu, Xiaofu Xu, Junzhen Jiang, Junzhen Jiang, Xiyao Chen, Xiyao Chen, Yishen Qiu, Yishen Qiu, } "Impact of the pattern layout on the performance of photonic crystal Fano broadband reflectors", Proc. SPIE 8198, 2011 International Conference on Optical Instruments and Technology: Optoelectronic Devices and Integration, 819806 (5 December 2011); doi: 10.1117/12.903954; https://doi.org/10.1117/12.903954
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