Paper
28 November 2011 New design method based on sagittal flat-field equipment of Offner type imaging spectrometer
Yiqun Ji, Rudong Xue, Weimin Shen
Author Affiliations +
Proceedings Volume 8200, 2011 International Conference on Optical Instruments and Technology: Optoelectronic Imaging and Processing Technology; 82000D (2011) https://doi.org/10.1117/12.907347
Event: International Conference on Optical Instruments and Technology (OIT2011), 2011, Beijing, Beijing, China
Abstract
Based on the wave aberration theory, a new method of optical design of the planate symmetric Offner type imaging spectrometer is performed. Astigmatism changing with the diffraction angle of the grating, the meridional and saggital focusing characters are all studied. Determination of the initial configurations and optimally design methods of two improved types of Offner imaging spectrometer are discussed in detailed. A design example with the numerical aperture larger than 0.2, and the entrance slit 30mm is given. Its spectral resolution is better than 2nm and MTF is above 0.7@20lp/mm. The smile and keystone are less than 3% and 0.2% of the pixel respectively.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yiqun Ji, Rudong Xue, and Weimin Shen "New design method based on sagittal flat-field equipment of Offner type imaging spectrometer", Proc. SPIE 8200, 2011 International Conference on Optical Instruments and Technology: Optoelectronic Imaging and Processing Technology, 82000D (28 November 2011); https://doi.org/10.1117/12.907347
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Cited by 5 scholarly publications.
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KEYWORDS
Spectroscopy

Monochromatic aberrations

Diffraction gratings

Diffraction

Mirrors

Imaging systems

Optical design

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