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23 December 2011 Comprehensive study of ZnO nanostructures grown using chemical bath deposition: from growth to application
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Abstract
ZnO nanostructures were grown using a simple and environmentally friendly chemical bath deposition technique on pre-treated p-type silicon substrate at temperatures below 100°C. The effects of growth parameters like seed layer density, growth time, growth temperature, precursor concentration and annealing temperature on the structural, morphological, electrical and optical properties of ZnO nanorods were systematically studied using field emission scanning electron microscopy, X-ray diffraction, photoluminescence spectroscopy and current-voltage measurements. A variety of architectures is demonstrated, ranging from single crystalline nanoparticles and c-axis orientated nanorods to highly compact crystalline thin films. Post-growth annealing at different temperatures profoundly affects the optical properties of the nanorods by, for example, reducing hydrogen- and intrinsic defect-related emission. The rectifying properties of the ZnO/Si heterojunction are discussed.
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Z. N Urgessa, D. M. Murape, O. S. Oluwafemi, A. Venter, M. Wagner, and J. R. Botha "Comprehensive study of ZnO nanostructures grown using chemical bath deposition: from growth to application", Proc. SPIE 8204, Smart Nano-Micro Materials and Devices, 82041Z (23 December 2011); https://doi.org/10.1117/12.903250
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