23 December 2011 Morphology and optical study of dye-doped TiO2-SiO2 thin films
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Abstract
In the present work, we have prepared functional dye doped TiO2-SiO2 thin films by vertical sedimentation technique. Thin film samples are annealed at different temperature from 50oC to 850oC. Morphology and chemical bonding information is analysed using atomic force microscopy (AFM), and Fourier transform infrared spectroscopy (FTIR) respectively. Optical properties are characterized by using UV-visible spectroscopy. Effect of annealing temperature on the photonic forbidden band gap is also presented. The experimental measured values are compared with theoretical estimated results.
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Arvind K. Gathania, Arvind K. Gathania, Naresh Dhiman, Naresh Dhiman, Ankita Sharma, Ankita Sharma, B. P. Singh, B. P. Singh, "Morphology and optical study of dye-doped TiO2-SiO2 thin films", Proc. SPIE 8204, Smart Nano-Micro Materials and Devices, 82043N (23 December 2011); doi: 10.1117/12.904869; https://doi.org/10.1117/12.904869
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